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We describe the design and construction of a high-precision laser writing machine for the direct generation of large-diameter rotationally symmetric diffractive optics with continuous profiles in photoresist. The photoresist profile can be used as a replication master surface or etched into a silica substrate. Machine design methodology, as well as qualification of performance, is provided. Test results for an f/2 100-mm clear-aperture diffractive lens directly etched into a silica substrate are presented. Diffraction efficiency as a function of zone spacing and wave-front performance are given.
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