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Simultaneous exposure and development of photoresist materials: an analytical model.
1977
P Agmon, and A C Livanos, and A Katzir, and A Yariv
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P Agmon, and A C Livanos, and A Katzir, and A Yariv
Theoretical modeling of the simultaneous exposure and development (SED) process of a positive photoresist.
July 1977, Applied optics,
P Agmon, and A C Livanos, and A Katzir, and A Yariv
Absorption and exposure in positive photoresist.
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P Agmon, and A C Livanos, and A Katzir, and A Yariv
Analytical expression for the standing wave intensity in photoresist.
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P Agmon, and A C Livanos, and A Katzir, and A Yariv
An analytical deterministic model for simultaneous phytoremediation of Ni and Cd from contaminated soils.
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P Agmon, and A C Livanos, and A Katzir, and A Yariv
Photoresist resolution measurement during the exposure process.
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P Agmon, and A C Livanos, and A Katzir, and A Yariv
Optical projection system design for photoresist exposure.
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P Agmon, and A C Livanos, and A Katzir, and A Yariv
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P Agmon, and A C Livanos, and A Katzir, and A Yariv
[Development of an Analytical Method for Simultaneous Determinationof Quinolones and Tetracyclines in Livestock and Fishery Products].
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P Agmon, and A C Livanos, and A Katzir, and A Yariv
Materials and procedures for development of manual/simultaneous communication (M/SC) skills: an exhibit.
November 1978, American annals of the deaf,
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